Chemcut’s photo resist developing systems provide very high productivity with excellent uniformity. The developers are based on Chemcut’s world leading
chemical etching technology. Both the
Chemcut Xli and
CC8000 product platforms as well as the non-modular
2315 bench spray etcher can be configured for developing. Therefore, Chemcut developing systems share common spare parts with Chemcut etching systems. Typical systems can be configured with developing contact lengths ranging from 20 inches (0.5 meter) to more than 120 inches (3 meters). Options are available for feed and bleed, pH control, panel counting, filtration, drying and more. Chemcut developers can be built for use with all common dry film photoresists, most aqueous based liquid resists, and aqueous based dry film and liquid solder mask resists. Additional information is available by
contacting Chemcut or from the local sales agents for Chemcut products. Contact information for the local agents can be found by clicking the
Sales & Service link above.