Chemcut’s Photo Resist Developing Systems are based on our world-leading chemical etching technology and deliver high productivity with excellent uniformity.
Our Chemcut Xli and CC8000 product platforms, as well as the non-modular 2300 Series, can also be configured for developing, meaning that Chemcut developing systems share common spare parts with our etching systems.
Typical systems can be configured with developing contact lengths ranging from 20 inches (0.5 meter) to more than 120 inches (3 meters). Options are available for feed and bleed, pH control, panel counting, filtration, drying, and more.
Chemcut developers can be built for use with all common aqueous resists, including: dry film photoresists, liquid resists, and dry film and liquid solder mask resists.