Custom Semiconductor Wafer Etching Processing Equipment
Common Semiconductor Equipment
Chemcut’s semiconductor equipment is an excellent choice for non-traditional processing of semiconductor wafers:
- Wafer Cleaning
- Aqueous Wafer Photoresist Developing
- Aqueous Wafer Photoresist Stripping
- Silicon Wafer Etching
- Glass Wafer Etching
- Wafer Metal Etching
Chemcut’s Wafer Processing Equipment
Chemcut’s continuous horizontal conveyor system allows for parallel processing of multiple pieces and can transport wafers, disks, squares, rectangles, and irregular shapes.
The standard conveyor requires a minimum piece size of 5 X 6 inches; however, depending upon the processes needed, conveyor options may be available to accommodate smaller materials.
We manufacture systems with useable conveyor widths from 15-60 inches, and a variety of machine lengths are available to match the required throughput rate.
Non-metallic and premium metal construction components ensure compatibility with a wide range of aqueous process solutions, including hydrofluoric acid and organic solvents. All equipment is built with fire retardant materials and applicable to SEMI specifications.
Optional materials are available for Class 100 clean rooms.
Customize Your Silicon Wafer Etching Process
Our equipment will be custom designed to meet your needs and specifications.
We have designed and built many custom semiconductor cleaning machines, wafer photoresist strippers, and Si wafer etching machines. We also have an R&D lab where we can test any chemistry and do etch rate tests to validate the process prior to manufacturing.
Whether you are cleaning, developing, stripping, or etching silicon wafers, Chemcut can build a custom machine for you.
XLi Chemical Cleaning System
- 20″
- 30″
- 40″
- 50″
- 60″
- Cleaner (Stand Alone)
- Alkaline Clean to Acid Clean
- Custom Size (1 to as many chambers as you want)
- Acid Cleaner
- Alkaline Cleaner
XLi Etching Systems
- 20″
- 30″
- 40″
- 50″
- 60″
- Custom Size (1 to as many chambers as you want)
- DES (Develop – Etch – Strip)
- Etcher (Stand Alone)
- SES (Strip – Etch – Strip)
- Alkaline Etchant
- Cupric Chloride Etchant
- Ferric chloride Etchant
- Hydrofluoric Acid (HF)
- Micro etch
- Aluminum
- Copper
- Glass
- Steel
- Titanium
- And more
XLi Developing Systems
- 20″
- 30″
- 40″
- 50″
- 60″
- Custom Size (1 to as many chambers as you want)
- Developer (Stand Alone)
- DES (Develop – Etch – Strip)
- 1% Potassium Carbonate
- 1% Sodium Carbonate
XLi Stripping Systems
- 20″
- 30″
- 40″
- 50″
- 60″
- Custom Size (1 to as many chambers as you want)
- DES (Develop – Etch – Strip)
- SES (Strip – Etch – Strip)
- Stripper (Stand Alone)
- Metal Resist Stripper
- Proprietary Aqueous or Semi-Aqueous Stripper
- Potassium Hydroxide
- Sodium Hydroxide
XLi with External Automatic Pressure Adjust
Control the spray pressure of each spray tube using the PLC instead of the throttling screw.
- 20″
- 30″
- 40″
- 50″
- 60″
- Custom Size (1 to as many chambers as you want)
- DES (Develop – Etch – Strip)
- Etcher (Stand Alone)
- SES (Strip – Etch – Strip)
- Alkaline Etchant
- Cupric Chloride Etchant
- Ferric chloride Etchant
- Hydrofluoric Acid (HF)
- Micro etch
- Aluminum
- Copper
- Glass
- Steel
- Titanium
- And more
121 Brush Cleaner
- Wet Brushing
- Oscillating Brushes
- Choice of bristle or compressed brushes
- Brushing
- Cleaner
- Finishing
- Remove Polishing
2300 Series Chemical Cleaning System
- 15″
- 20″
- 30″
- Cleaner (Stand Alone)
- Alkaline Clean to Acid Clean
- Custom Size (1 to as many chambers as you want)
- Acid Cleaner
- Alkaline Cleaner
2300 Series Etching System
- 15″
- 20″
- 30″
- Custom Size (1 to as many chambers as you want)
- DES (Develop – Etch – Strip)
- Etcher (Stand Alone)
- SES (Strip – Etch – Strip)
- Alkaline Etchant
- Cupric Chloride Etchant
- Ferric chloride Etchant
- Hydrofluoric Acid (HF)
- Micro etch
- Aluminum
- Copper
- Glass
- Steel
- Titanium
- And more
2300 Series Dryer
- 15″
- 20″
- 30″
- 40″
- Stand-alone drying system
- Portable unit (move anywhere in the shop) or fix it in place
2300 Series Stripping System
- 15″
- 20″
- 30″
- Custom Size (1 to as many chambers as you want)
- DES (Develop – Etch – Strip)
- SES (Strip – Etch – Strip)
- Stripper (Stand Alone)
- Metal Resist Stripper
- Proprietary Aqueous or Semi-Aqueous Stripper
- Potassium Hydroxide
- Sodium Hydroxide
2300 Series Developing System
- 15″
- 20″
- 30″
- Custom Size (1 to as many chambers as you want)
- Developer (Stand Alone)
- DES (Develop – Etch – Strip)
- 1% Potassium Carbonate
- 1% Sodium Carbonate
- dry film photoresists
- liquid photoresists
- Aqueous solder mask resist (dry and liquid)
- And many more resists
CC8000 Chemical Cleaning System
- 20″
- 30″
- 40″
- 50″
- 60″
- Cleaner (Stand Alone)
- Alkaline Clean to Acid Clean
- Custom Size (1 to as many chambers as you want)
- Acid Cleaner
- Alkaline Cleaner
CC8000 Developing Systems
- 20″
- 30″
- 40″
- 50″
- 60″
- Custom Size (1 to as many chambers as you want)
- Developer (Stand Alone)
- DES (Develop – Etch – Strip)
- 1% Potassium Carbonate
- 1% Sodium Carbonate
- dry film photoresists
- liquid photoresists
- Aqueous solder mask resist (dry and liquid)
- And many more resists
CC8000 Etching Systems
- 20″
- 30″
- 40″
- 50″
- 60″
- Custom Size (1 to as many chambers as you want)
- DES (Develop – Etch – Strip)
- Etcher (Stand Alone)
- SES (Strip – Etch – Strip)
- Alkaline Etchant
- Cupric Chloride Etchant
- Ferric chloride Etchant
- Hydrofluoric Acid (HF)
- Micro etch
- Aluminum
- Copper
- Glass
- Steel
- Titanium
- And more
CC8000 Stripping Systems
- 20″
- 30″
- 40″
- 50″
- 60″
- Custom Size (1 to as many chambers as you want)
- DES (Develop – Etch – Strip)
- SES (Strip – Etch – Strip)
- Stripper (Stand Alone)
- Sodium Hydroxide
- Potassium Hydroxide
- Proprietary Aqueous or Semi-Aqueous Stripper
- Metal Resist Stripper
Etch Adjust Module (EAM)
- CC8000 Etching Systems
- XLi Etching Systems
- Plated boards: Correct side to side etch difference when one side is plated more
- Fine-tune very small features
Related Resources
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