Photoresist Stripper for Dry Film, Liquid, Soldermask, and More
Product Line for Photoresist Stripping
Common Photoresists Stripped
Dry film photoresists (aqueous-based)
Ink resist (aqueous-based)
Liquid photoresists (aqueous-based for high resolution )
Non-Aqueous Resist used in Wafer Manufacturing
Solder mask resist dry and liquid
Tin resist
Common Uses for Chemcut Strippers
Stripping photoresist for PCBs and chemical milling
Stripping photoresist on glass surfaces
Stripping resist on wafers and semiconductor industry (SEMI)
Stripping metallic resist for PCBs (Tin Strip)
Stripping using organic solvents
Common Equipment Parameters
Speed range: 14 – 140 inches / minute
Max temperature: 160 °F (can make a 200 °F stripper)
Photoresist Stripping Process
The photoresist stripping process follows the wet etching step and as a whole is less technical than the other wet processes. Basically, the resist needs to be in the chemistry long enough to strip. We build strippers for both positive photoresist and negative photoresist.
There are a couple of important factors to take into account if you want an efficient stripping line.
First, you need to work with your chemistry supplier and photoresist film supplier to make sure your resist and chemistry are compatible with each other. If they are not compatible you will see your resist stripping off in sheets, as goo, as large pieces, or very fine pieces.
None of these are good!
You want your resist to strip in small chips. The reason you want small chips is that our strippers are designed to filter out small chips.
If you are getting any other size or goo, this means your resist and chemistry are a mismatch, our stripper will have a hard time filtering out particles. This will result in plugged nozzles.
Once you have a perfect match of chemistry and resist, we can move onto how our stripper design will help your process.
Our stripping machines are designed with world-class filtering which will increase your lines efficiency, speed, and cleanliness.
Stripping resist creates a lot of small particles. These particles have the potential to cripple your throughput if not filtered correctly. We design our stripper to have a clean sump and a dirty sump. Separating as many particles from the pumps feeding the spray tubes as possible and returning stripper solution to the clean sump after filtration.
The dirty sump will then be pumped through our on-board resist filter. The filtered resist will then be pumped to our bulk separator.
This design has helped many chemical etching plants optimize their throughput by decreasing downtime and maintenance time on their stripper module.
Chemcut also offers a range of high-pressure options for the sometimes-difficult task of removing photoresist after a plating step. Pump and spray pressures of 100 psi up to 500 psi is possible. A high-pressure station can be easily added to our modular systems if needed, XLi or CC8000. Check out our other options that can be added to your stripping machine.
Specifically, for building Strippers, customers love that we have the ability to test the chemistry for compatibility. We can also do spraying tests. Which will result in more accurate photoresist stripping time estimates.
