CC8000 Stripping Systems

Available Conveyor Widths 

• • 20″
  • 30″
  • 40″
  • 50″
  • 60″
  • 74″

Common Processes 

• • Stripper (Stand Alone)
  • DES (Develop – Etch – Strip)
  • SES (Strip – Etch – Strip)
  • Custom Size (1 to as many chambers as you want)

Common Chemicals  

• • Alkaline Etchant
  • Cupric Chloride Etchant
  • Ferric chloride Etchant
  • Hydrofluoric Acid (HF)
  • Micro etch

Common Materials Etched

• • Dry film photoresists (aqueous-based)
  • Ink resist (aqueous-based)
  • Liquid photoresists (aqueous-based)
  • Plating resist (aqueous-based)
  • Solder mask resist dry and liquid
  • Tin resist (can make equipment compatible with ammonium bifuoride)
  • And many more